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Electromigration in ULSI Interconnections provides a comprehensive description of the electromigration in integrated circuits. It;
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Applications of Finite Element Methods for Reliability Studies on ULSI Interconnections provides a detailed description of the application;
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interconnections began to influence circuit performance and will be the primary factors in the evolution of nanoscale ULSI technology. Because metallic;
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interconnects have served well, allowing for the creation of Ultra Large Scale Integration (ULSI) devices which combine over a billion transistors onto;
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, crosstalk noise, and electromigration-induced failure associated with the interconnections in the realistic high-density environment on a chip will;
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More than 1,100 TEM images illustrate the science of ULSI The natural outgrowth of VLSI (Very Large Scale Integration), Ultra Large Scale;
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A complete guide to current knowledge and future trends in ULSI devices Ultra-Large-Scale Integration (ULSI), the next generation;
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The book provides a comprehensive overview of electromigration and its effects on the reliability of electronic circuits. It introduces the;
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The book provides a comprehensive overview of electromigration and its effects on the reliability of electronic circuits. It introduces the;
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Electromigration is a mass transport effect in metals under high current densities, which causes the metal atoms to migrate away from a;
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New Approaches to Image Processing Based Failure Analysis of Nano-Scale ULSI Devices introduces the reader to transmission and scanning;
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Capillary Electromigration Separation Methods is a thorough, encompassing reference that not only defines the concept of contemporary;
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technological challenges. Crystal Growth and Evaluation of Silicon for VLSI and ULSI is one of the first books to cover the systematic growth;
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technological challenges. Crystal Growth and Evaluation of Silicon for VLSI and ULSI is one of the first books to cover the systematic growth;
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increases the failure rate for ICs with decreasing interconnect dimension and increasing number of interconnect levels. Electromigration (EM;
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) of biologically relevant compounds. It is assumed that the potential reader is familiar with the basics of chromatographic and electromigration methods;
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) process technologies-the longstanding technology driver of Si ULSI-as they advance from the 1 Kbit to the Gbit DRAM era.;
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) process technologies-the longstanding technology driver of Si ULSI-as they advance from the 1 Kbit to the Gbit DRAM era.;
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, bioelectroanalysis, nanoparticles, quantitative NMR, mass spectrometry, immunosensors and -assays, or chiral electromigration techniques. Originally;
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This special guest-edited fascicle of the Journal of Ancient Egyptian Interconnections focuses on Nu;...
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, physical metallurgy, mechanical properties, electromigration, and reliability of solder joint. The scope of this book covers mainly, but not;
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It is with the greatest pleasure that the editors of the Journal of Ancient Egyptian Interconnection;...
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The success or failure of inclusive business often depends on institutional interconnections. By exa;...
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models used to explain degradation, and the statistical handling of lifetime data. Electromigration, dielectric radiation damage and the;
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. The author covers faults and failures in ULSI devices induced by a wide variety of radiation fields, including electrons, alpha-rays, muons;
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