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High-k Gate Dielectric Materials

semiconductor industry and the International Technology Roadmap for Semiconductors (ITRS). The application of high-k gate dielectric materials is a;

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High-k Gate Dielectrics for CMOS Technology

A state-of-the-art overview of high-k dielectric materials for advanced field-effect transistors, from both a fundamental and a;

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Nano-CMOS Gate Dielectric Engineering

covering the physics, materials, devices, and fabrication processes for high-k gate dielectric materials, Nano-CMOS Gate Dielectric Engineering;

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Materials and Devices for End-Of-Roadmap and Beyond CMOS Scaling

This proceedings volume contains papers presented at Symposium I, 'Materials for End-of-Roadmap Scaling of CMOS Devices', and Symposium J;

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Nanometer CMOS

concepts, such as multiple-gate structures or alternative channel materials. Other topics covered include high-k dielectrics and mobility;

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High k Gate Dielectrics

microelectronics community. High k Gate Dielectrics reviews the state-of-the-art in high permittivity gate dielectric research. Consisting;

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CMOS Gate-Stack Scaling Materials, Interfaces and Reliability Implications

concerns for high-k/metal gate (basic physical models, charge trapping, etc.), while others cover characterization of the thin films and interfaces;

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CMOS Gate-Stack Scaling Materials, Interfaces and Reliability Implications

concerns for high-k/metal gate (basic physical models, charge trapping, etc.), while others cover characterization of the thin films and interfaces;

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CMOS Past, Present and Future

technology and its evolution to the present, along with a vision for future trends. The book examines the challenges and opportunities that;

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Reliability of high-k / metal gate field-effect transistors considering circuit operational constraints

unintentional high gate leakage currents for gate oxide thicknesses below 2 nm. The introduction of high-k metal gate stacks guaranteed the trend;

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Monotonic Static CMOS

applications in high performance low power VLSI circuits. The main goal of this thesis is to provide a set of data to show the usefulness of MS-CMOS;

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Fundamentals of Modern VLSI Devices

devices, as well as factors affecting performance. Containing around 25% new material, coverage has been expanded to include high-k gate;

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Nanoscale CMOS

modeling and characterization methods for nanoscale CMOS devices. Leading global industry bodies including the International Technology Roadmap;

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MOS System

and metals, before moving on to electrical and physical characterization methods for high-k dielectric materials. Finally, real MOS systems;

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Ferroelectric Dielectrics Integrated on Silicon

This book describes up-to-date technology applied to high-K materials for More Than Moore applications, i.e. microsystems applied to;

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Chemical Processing of Dielectrics, Insulators and Electronic Ceramics

and solid-state chemistry, materials science, chemical physics and chemical engineering. Highlights include the deposition of high-k;

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Charge Trapping Non Volatile Memories

technology for charge-trapping non-volatile memories; Details new architectures and current modeling concepts for non-volatile memory devices;

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Strain-Engineered MOSFETs

germanium-on-insulator platforms, combined with high-k insulators and metal-gate. It covers the materials aspects, principles, and design;

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Strain-Engineered MOSFETs

germanium-on-insulator platforms, combined with high-k insulators and metal-gate. It covers the materials aspects, principles, and design;

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Microelectronic Test Structures for CMOS Technology

Microelectronic Test Structures for CMOS Technology and Products addresses the basic concepts of the design of test structures for;

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Handbook of Microwave Technology for Food Application

Integrates principles of electromagnetics, dielectrics, heat and moisture transfer, packaging, solid;...

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Liquid Dielectrics in an Inhomger

field. Written by leading experts in the field, it is the first of its kind to address numerous potential applications such as the technology;

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High Mobility Materials for CMOS Applications

High Mobility Materials for CMOS Applications provides a comprehensive overview of recent developments in the field of (Si)Ge and III-V;

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Tradeoffs and Optimization in Analog CMOS Design

Analog CMOS integrated circuits are in widespread use for communications, entertainment, multimedia, biomedical, and many other;

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Smart Cmos Image Sensors and Applications

a firm foundation in existing smart CMOS image sensor technology and applications, preparing you for the next phase of smart CMOS image;

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Smart CMOS Image Sensors and Applications

a firm foundation in existing smart CMOS image sensor technology and applications, preparing you for the next phase of smart CMOS image;

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Hf-based High-k Dielectrics

In this work, the reliability of HfO2 (hafnium oxide) with poly gate and dual metal gate electrode (;...

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