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This volume explores and addresses the challenges of high-k gate dielectric materials, one of the major concerns in the evolving;
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microelectronics community. High k Gate Dielectrics reviews the state-of-the-art in high permittivity gate dielectric research. Consisting;
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A state-of-the-art overview of high-k dielectric materials for advanced field-effect transistors, from both a fundamental and a;
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the ideal MOS system, physical and electrical properties of high-k oxides, their dielectric constants, and energy offsets to semiconductors;
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In this work, the reliability of HfO2 (hafnium oxide) with poly gate and dual metal gate electrode (;...
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concepts, such as multiple-gate structures or alternative channel materials. Other topics covered include high-k dielectrics and mobility;
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and solid-state chemistry, materials science, chemical physics and chemical engineering. Highlights include the deposition of high-k;
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devices, as well as factors affecting performance. Containing around 25% new material, coverage has been expanded to include high-k gate;
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of the transistors, leaving high-k materials as the only viable solution for such small-scale EOT. This comprehensive, up-to-date text;
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This book describes up-to-date technology applied to high-K materials for More Than Moore applications, i.e. microsystems applied to;
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unintentional high gate leakage currents for gate oxide thicknesses below 2 nm. The introduction of high-k metal gate stacks guaranteed the trend;
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-k interdielectric materials are currently in high demand in the development of advanced ICs. One important approach to obtaining low-k;
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, this situation has been completely revolutionized with the introduction of the likes of copper interconnects, high-k gate dielectrics, metal;
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concerns for high-k/metal gate (basic physical models, charge trapping, etc.), while others cover characterization of the thin films and interfaces;
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concerns for high-k/metal gate (basic physical models, charge trapping, etc.), while others cover characterization of the thin films and interfaces;
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of high-voltage insulation in pulsed inhomogeneous fields, and applications related to cavitation development in liquid dielectrics, plasma;
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This book highlights important achievements and challenges in advanced interconnects and low-k dielectrics as employed in the;
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-thermodynamic approach to the construction of nonlinear high-order gradient theory of thermoelastic non-ferromagnetic polarized media. This approach;
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silicon nitride and high-k, low-k, and electro-optically active oxides; and metals, in particular silicide alloys. The impact of film growth and;
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Integrates principles of electromagnetics, dielectrics, heat and moisture transfer, packaging, solid;...
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In this book, the authors discuss the theory of operation, behaviour and safety regulations of capac;...
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and desorption currents in time domains, and high field conduction phenomena. Dielectrics in Electric Fields is an interdisciplinary reference;
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and desorption currents in time domains, and high field conduction phenomena. Dielectrics in Electric Fields is an interdisciplinary reference;
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