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MRS Proceedings Ion Beam Processes in Advanced Electronic Materials and Device Technology

The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.;

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Focused Ion Beam Systems

, comprehensively covers the ion beam technology including the DualBeam. The basic principles of ion beam and two-beam systems, their interaction with;

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Focused Ion Beam Systems

, comprehensively covers the ion beam technology including the DualBeam. The basic principles of ion beam and two-beam systems, their interaction with;

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Ion Implantation into Semiconductors, Oxides and Ceramics

attracted 110 contributions, with authors from 31 nations in 5 continents. It was thereby the largest in a series of E-MRS ion beam symposia;

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Gaas High-Speed Devices

light, in chapter 3, on epitaxial growth processes, molecular beam epitaxy, and metal organic chemical vapor deposition techniques. Chapter 4;

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Surface Engineering in Materials Science III

modification by plasma, ion, and laser beam techniques; direct fabricated materials; coatings for space, automobile, and environmental industries;

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MRS Proceedings Materials Development for Direct Write Technologies

including plasma spray, laser particle guidance, MAPLE DW, laser CVD, micropen, inkjet, e-beam, focused ion beam, and several novel liquid or;

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Ion Beams in Materials Processing and Analysis

technology. The physics of ion-solid interactions for ion implantation, ion beam synthesis, sputtering and nano-patterning is treated in detail. Its;

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Ion Beam Treatment of Polymers

density and wide ion beams increase the effectiveness of ion beam technology for polymers. Collates data from many scientists working;

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Advances in Dielectric Materials and Electronic Devices

This proceedings contains papers presented at the Advanced Dielectric Materials: Design, Preparation, Processing and Applications; and;

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Materials Processing by Cluster Ion Beams

Materials Processing by Cluster Ion Beams: History, Technology, and Applications discusses the contemporary physics, materials science;

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Sub-Half-Micron Lithography for ULSIs

, and focused ion-beam lithography are described in detail by experts in each area. The principles underlying each of these methods are;

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FIB Nanostructures

at the nanoscale. Focused Ion Beam (FIB) is an important tool for manipulating the structure of materials at the nanoscale, and substantially;

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Ion Beam Modification of Solids

This book presents the method of ion beam modification of solids in realization, theory and applications in a comprehensive way. It;

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Molecular Beam Epitaxy

of the field, this book covers fundamentals of Molecular Beam Epitaxy (MBE) technology and science, as well as state-of-the-art MBE technology;

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Ion Beams - New Applications from Mesoscale to Nanoscale

Symposium II, 'Ion Beams - New Applications from Mesoscale to Nanoscale', was held at the 2011 MRS Spring Meeting, April 25-29, in San;

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Materials Fundamentals of Molecular Beam Epitaxy

The technology of crystal growth has advanced enormously during the past two decades. Among, these advances, the development and;

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Ion Irradiation of Dielectrics for Photonic Applications

devices. Given its breadth of coverage, the book will particularly appeal to readers interested in ion-beam technology, materials science, and;

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Ion Irradiation of Dielectrics for Photonic Applications

devices. Given its breadth of coverage, the book will particularly appeal to readers interested in ion-beam technology, materials science, and;

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Introduction to Focused Ion Beam Nanometrology

This book describes modern focused ion beam microscopes and techniques and how they can be used to aid materials metrology and as tools for;

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Trends in Semiconductor Research

preparation of materials, including both epitaxial (e.g. molecular beam and chemical vapour methods) and bulk techniques; in situ monitoring;

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New Developments in Semiconductor Research

preparation of materials, including both epitaxial (e.g. molecular beam and chemical vapour methods) and bulk techniques; in situ monitoring;

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Engineering Thin Films and Nanostructures with Ion Beams

storage devices, photonics, opto-electronics, and molecular transport. Engineering Thin Films and Nanostructures with Ion Beams offers a thorough;

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New Research on Semiconductors

preparation of materials, including both epitaxial (e.g. molecular beam and chemical vapour methods) and bulk techniques; in situ monitoring;

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Focus on Semiconductor Research

preparation of materials, including both epitaxial (e.g. molecular beam and chemical vapour methods) and bulk techniques; in situ monitoring;

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Semiconductor Research Trends

preparation of materials, including both epitaxial (e.g. molecular beam and chemical vapour methods) and bulk techniques; in situ monitoring;

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Frontal Semiconductor Research

preparation of materials, including both epitaxial (e.g. molecular beam and chemical vapour methods) and bulk techniques; in situ monitoring;

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