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Handbook of Plasma Immersion Ion Implantation and Deposition

This is the first book to describe a family of plasma techniques used to modify the surface and near-surface layer of solid materials.;

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Advancing Silicon Carbide Electronics Technology II

Deposition, Field Effect Mobility, Ion Implantation, Post Implantation Annealing, Channeling, Surface Roughness, Dry Etching, Plasma Etching, Ion;

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Plasma Production By Laser Ablation

, ion implantation, ion post-acceleration and thin film deposition by the PLD technique.The proceedings have been selected for coverage;

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Handbook of Chemical Vapor Deposition

applications of chemical vapor deposition in semiconductors and electronics. The final chapter deals with ion implantation as a major process in the;

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Atomic and Ion Collisions in Solids and at Surfaces

depth profiling. Industrial applications include optical or hard coating deposition, ion implantation in semiconductor device manufacture or;

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Atomic and Ion Collisions in Solids and at Surfaces

depth profiling. Industrial applications include optical or hard coating deposition, ion implantation in semiconductor device manufacture or;

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Materials Processing by Cluster Ion Beams

ion-assisted deposition Details surface processing techniques for smoothing, shallow implantation, and preparation of high-quality thin;

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Handbook of Ion Sources

principle function of ion sources. The basic plasma parameters are defined and discussed. The working principles of various ion sources are;

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Encyclopedia of Ion Implantation

This book examines the constantly transforming technology of ion implantation. Ion implantation is an advancing field, owing to the;

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Electron Free Plasma

fundamental research and plasma processing applications. Electronegative gas plasmas are widely used in microelectronics manufacturing for etching and;

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Ion Implantation Techniques: Lectures given at the Ion Implantation School in Connection with Fourth International Conference on Ion Implantation

dealt with the application of ion implantation to semiconductors and other materials (Thousand Oaks 1970, Garmisch-Partenkirchen 1971, Osaka;

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Amorphous-Nanocrystalline Alloys

, deformation effect, and pulse treatments (photon, laser and ultrasound), spraying thin films, and ion implantation). Theoretical and experimental;

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Amorphous-Nanocrystalline Alloys

, deformation effect, and pulse treatments (photon, laser and ultrasound), spraying thin films, and ion implantation). Theoretical and experimental;

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Handbook of Deposition Technologies for Films and Coatings

areas concerned with plasma-assisted vapor deposition processes and metallurgical coating applications.;

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Defects in Optoelectronic Materials

growth, in various processes such as plasma processing, deposition and implantation, and in device degradation. This book also provides graduate;

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Properties and Processing of Vapor-Deposited Coatings

development of a large-scale DLC coating chamber, based on a novel process concept called 'plasma ion immersion process,' is presented. Progress;

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Advances in Materials Science Research

-immersion ion implantation are explored. Additionally, the structural, electronic, magnetic and optical properties of BiFeO3 and its doped sister;

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Ion Implantation for High-Efficiency Silicon Solar Cells.

conversion efficiency potential and new technologies are needed to keep the fabrication effort low. Ion implantation allows for single side and even;

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Plasma Spray Technology Handbook

applicability because of the nature of the plasma plume and deposition structure. The plasma gas produced by the arc comprises of free electrons;

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Handbook of Advanced Semiconductor Technology and Computer Systems

Chapter I describes deposition as a basic microelectronics technique. Plasma enhanced chemical vapor deposition (PECVD) is a technique;

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Ion Implantation into Semiconductors, Oxides and Ceramics

These proceedings contain the reviewed papers presented at the Symposium J on "Ion Implantation into Semiconductors, Oxides and;

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Principles of Plasma Discharges and Materials Processing

and Materials Processing , published over a decade ago, was lauded for its complete treatment of both basic plasma physics and industrial;

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Laser-Induced Plasmas

This book examines the theory and applications of laser-induced plasmas. Topics discussed include the application of laser-induced plasma;

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Vapor Surface Treatments

of the processes and the microscopic characterization of the produced coatings. Vacuum evaporation, cathodic sputtering and ion implantation;

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Laser-Assisted Deposition of Boron Nitride Thin Films & Nanotubes

substrate. This book reviews research on the depositon of c-BN films by using PLD, ion-assisted PLD and other laser-assisted procedures.;

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Ion Implantation Range and Energy Deposition Distributions

The present level of understanding of ion implantation is sufficient that implantation Ls being used not only as a tool in various fields;

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Handbook Of Thin Film Technology

Handbook of Thin Film Technology covers all aspects of coatings preparation, characterization and applications. Different deposition;

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